Non-Volatile Bipolar TiN/LaMnO3/Pt Memristors with Optimized Performance - Université d'Artois
Article Dans Une Revue Materials Today Electronics Année : 2023

Non-Volatile Bipolar TiN/LaMnO3/Pt Memristors with Optimized Performance

Résumé

LaMnO 3+δ (LMO) perovskite is a very interesting candidate for Valence Change Memories due to its flexible stoichiometry, accommodated through the Mn +3 /Mn +4 equilibrium, at the origin of significant resistivity changes. Here, the successful combination of a LMO layer, with a top active TiN electrode and a bottom inert Pt electrode, is presented. The manganite layer is integrated on silicon-based substrates in the form of a polycrystalline film. By comparing the memristive behavior of these TiN/LMO/Pt devices with Au/LMO/Pt devices prepared on the same film, the essential role of the active oxygen electrode is put in evidence. TiN/LMO/Pt memristive devices show optimized performance, operating in both sweep and pulse mode, with the capability of cycling more than a hundred times and showing good retention. Furthermore, a simple phenomenological model describing the memristive behavior of the devices is also presented.
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Dates et versions

hal-04260437 , version 1 (26-10-2023)

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Domaine public

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Raquel Rodriguez-Lamas, Dolors Pla, Caroline Pirovano, Odette Chaix-Pluchery, Carlos Moncasi, et al.. Non-Volatile Bipolar TiN/LaMnO3/Pt Memristors with Optimized Performance. Materials Today Electronics, 2023, 5, pp.100054. ⟨10.1016/j.mtelec.2023.100054⟩. ⟨hal-04260437⟩
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