Biomembranes Aryl-diazonium salts Chalcogenide Carbon Nanotube Films Rutile Resistive switching Plasma etching Buffer Couple Titanium dioxide B1 Inorganic compounds CNTs’ collapse Mott insulator A Multilayers CHLORINE PLASMAS AuCu alloy XPS Alloying Aluminium nitride Ambipolar material Amorphous Mass spectrometry Low-pressure plasma processing X-ray diffraction Optical waveguides Transfert d'énergie Oxides Carbon Anatase Physical vapor deposition Band gap Etching Biocapteurs A Thin films 3 nm in size PECVD B2 Semiconducting indium compounds A Chalcogenides Residual stress AZO thin films Integrated optics Structure Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation A1 Characterization Atomic layer etching Adsorption Bipolar resistive switching BRS Amyloid precursor Kirkendall effect Spectroscopic ellipsometry Sputtering CIGSe Avalanche breakdown A-CNx TiO2 B2 Quaternary AlN Atomic force microscopy B3 Solar cells SF 6 Nanotubes B Chemical synthesis Applications industrielles Sol-gel A3 Physical vapor deposition processes BOMBARDMENT B2 Semiconducting alloys Thin film Mott insulators Biomasse Nanocomposite Thin films Capacitance Vanadium Sesquioxide Calcined clay Functionalization Ablation laser Colloidal solution Non-volatile memory Plasmas froids Semiconductors TEM X-ray photoelectron spectroscopy CH4 Optical interferometry Alzheimer's disease Scanning electron microscopy V2O3 Optical properties Copper Selenization Biofilms microbiens Band alignment CaTiO3Pr^3^+ Transmission electron microscopy NEXAFS Magnetron sputtering Bixbyite C Photoelectron spectroscopy Annealing